A hybrid aerodynamic and electrostatic atomization system for enhanced uniformity of thin film SCIE SCOPUS
DC Field | Value | Language |
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dc.contributor.author | Seong, Baekhoon | - |
dc.contributor.author | Hwang, Sangyeon | - |
dc.contributor.author | Jang, Hyung-Seok | - |
dc.contributor.author | Lee, Hyungdong | - |
dc.contributor.author | Kim, Jihoon | - |
dc.contributor.author | Vu Dat Nguyen | - |
dc.contributor.author | Cho, Dae-Hyun | - |
dc.contributor.author | Lin, Liwei | - |
dc.contributor.author | Byun, Doyoung | - |
dc.date.accessioned | 2021-03-17T08:25:27Z | - |
dc.date.accessioned | 2021-03-17T08:25:27Z | - |
dc.date.available | 2021-03-17T08:25:27Z | - |
dc.date.available | 2021-03-17T08:25:27Z | - |
dc.date.created | 2020-01-28 | - |
dc.date.issued | 2017-06 | - |
dc.identifier.issn | 0304-3886 | - |
dc.identifier.uri | https://sciwatch.kiost.ac.kr/handle/2020.kiost/40358 | - |
dc.description.abstract | Droplet deposition processes by the mechanisms of either aerodynamics or electrostatic spray have been widely studied in various applications such as aerosol generators, thin film coatings, and nanoparticle formations. Among the current state-of-art methodologies, air spray deposition can produce small-sized droplets without fine control on their sizes and uniformity in deposited thin films. Conventional electrospray depositions, on the other hand, can fabricate thin films with good uniform with a relatively slow deposition speed. In this paper, a hybrid mechanism by means of aerodynamic and electrostatic deposition is investigated and demonstrated to allow high throughput and improved uniformity for thin film depositions. It utilizes both the electrostatic force and aerodynamic force to atomize the liquid and control the droplet spraying process with good stability/repeatability. A uniform thin TiO2 film has been deposited as the demonstration example using this method. The velocities and trajectories of droplets during the deposition process have been characterized under different experimental parameters by using the technique of particle image velocimetry (PIV). This hybrid thin film fabrication method could be applicable in several industrial processes for better uniformity in making transparent electrodes, solar cells, displays, and automobiles. (C) 2017 Elsevier B.V. All rights reserved. | - |
dc.description.uri | 1 | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | DIELECTRIC-CONSTANT | - |
dc.subject | SPRAY DEPOSITION | - |
dc.subject | SCALING LAWS | - |
dc.subject | SOLAR-CELLS | - |
dc.subject | LARGE-AREA | - |
dc.subject | TRANSPARENT | - |
dc.subject | NETWORKS | - |
dc.subject | NANOPARTICLES | - |
dc.subject | ELECTROSPRAY | - |
dc.subject | SIMULATION | - |
dc.title | A hybrid aerodynamic and electrostatic atomization system for enhanced uniformity of thin film | - |
dc.type | Article | - |
dc.citation.endPage | 101 | - |
dc.citation.startPage | 93 | - |
dc.citation.title | JOURNAL OF ELECTROSTATICS | - |
dc.citation.volume | 87 | - |
dc.contributor.alternativeName | 성백훈 | - |
dc.contributor.alternativeName | 김지훈 | - |
dc.identifier.bibliographicCitation | JOURNAL OF ELECTROSTATICS, v.87, pp.93 - 101 | - |
dc.identifier.doi | 10.1016/j.elstat.2017.04.006 | - |
dc.identifier.scopusid | 2-s2.0-85018643243 | - |
dc.identifier.wosid | 000405762900011 | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.subject.keywordPlus | DIELECTRIC-CONSTANT | - |
dc.subject.keywordPlus | SPRAY DEPOSITION | - |
dc.subject.keywordPlus | SCALING LAWS | - |
dc.subject.keywordPlus | SOLAR-CELLS | - |
dc.subject.keywordPlus | LARGE-AREA | - |
dc.subject.keywordPlus | TRANSPARENT | - |
dc.subject.keywordPlus | NETWORKS | - |
dc.subject.keywordPlus | NANOPARTICLES | - |
dc.subject.keywordPlus | ELECTROSPRAY | - |
dc.subject.keywordPlus | SIMULATION | - |
dc.subject.keywordAuthor | Electrostatic spray | - |
dc.subject.keywordAuthor | Charged droplet | - |
dc.subject.keywordAuthor | Particle image velocimetry (PIV) | - |
dc.subject.keywordAuthor | Thin film deposition | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Engineering | - |